Postdoctoral Researcher in Data-driven X-ray Nanoimaging for Semiconductor Metrology — EPFL
- Località
- Villigen
- Contratto
- full-time
- Pubblicato
- Ieri
Panoramica
Mission
The performance of X-ray microscopy has improved significantly over the last decade, enabling synchrotron-based X-ray imaging to resolve individual transistors in modern semiconductor devices.
As the industry moves to 3D transistor architectures and stacked, hybrid-bonded devices, non-destructive, high-resolution 3D imaging is becoming a necessity.
- Mission
- The performance of X-ray microscopy has improved significantly over the last decade, enabling synchrotron-based X-ray imaging to resolve individual transistors in modern semiconductor devices.
- Main duties and responsibilities
- You will develop an acquisition and reconstruction framework that uses the known geometry, composition, and layout regularity of semiconductor devices as prior information to detect deeply buried defects from the smallest possible number of X-ray measurements.
Responsabilità principali
- Main duties and responsibilities
- You will develop an acquisition and reconstruction framework that uses the known geometry, composition, and layout regularity of semiconductor devices as prior information to detect deeply buried defects from the smallest possible number of X-ray measurements.
- Our pipeline reconstructs each projection from thousands of diffraction patterns, followed by volume reconstruction from projections measured at many rotation angles.
- These are two inverse problems, each with its own sampling requirements. The questions we want to answer:
- What is the minimum number of diffraction patterns and projections needed to identify a defect?
- Can we detect defects from diffraction patterns alone, bypassing projection reconstruction?
- Can we reliably identify defects without ever resolving them?
- What is the best way to incorporate the known design information into the imaging process?
- The primary focus will be on algorithm development, followed by their demonstration at synchrotron experiments.
- You will start working with real already existing experimental datasets and will have the opportunity to extend our established reconstruction pipeline, and integrate with new data acquisition methods.
Processo di candidatura
- Unfortunately, current 3D X-ray nanoimaging methods are prohibitively slow for practical semiconductor metrology and inspection applications.
- Unlike most samples placed under a microscope, microchips are manufactured objects that follow strict design rules.
- This allows us to shift from the standard imaging question of "what is the structure of this sample?" to "how does the structure differ from the known design?".
- The second question can be answered with far fewer measurements than the first.
- The newly established Laboratory for Nanoscale X-ray Metrology is looking for a motivated postdoctoral researcher to turn this idea into a working method.
- This is one of two postdoctoral positions opening in the group.
- This position focuses on high-throughput imaging of static structural defects, while the companion position focuses on time-resolved imaging of dynamic processes.
- Each postdoc will lead their own independent research direction, with an opportunity for close collaborative work.
Dettagli ulteriori
- These are two inverse problems, each with its own sampling requirements. The questions we want to answer:
- You will also get a chance to perform experiments at the cSAXS beamline of the upgraded Swiss Light Source synchrotron, as well as other facilities around the world. We are looking for a person with:
- Semiconductor devices or metrology.
Note e contenuto originale
- These are two inverse problems, each with its own sampling requirements.
- The questions we want to answer:
- You will also get a chance to perform experiments at the cSAXS beamline of the upgraded Swiss Light Source synchrotron, as well as other facilities around the world.
- We are looking for a person with:
Domande frequenti su questo annuncio
Che stipendio offre EPFL per questa posizione?
EPFL indica CHF 62'000 - 94'000 lordi annui per questo ruolo a Villigen. Questo è lo stipendio pubblicato nell'annuncio originale (o, quando il datore non specifica una cifra, una stima realistica per ruolo e settore) — il calcolatore di questo sito lo converte nel netto reale una volta applicate imposta da frontaliere e contributi sociali.
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